AES investigation of the stainless steel surface oxidized in plasma

Abstract

Auger electron spectroscopy (AES) depth profiling was used to study the oxidation phenomena of AISI316L stainless steel during treatment with oxygen plasma. Samples were exposed to low-pressure RF plasma with a high dissociation degree, so that the flux of oxygen atoms onto the sample surface exceeded 10 24 m −2 s −1. A set of samples was oxidized 4 min at different temperatures up to 1300 K during plasma treatment. AES measurements showed that the oxide film thickness increased with the increasing temperature. The thickness of the oxide film on the samples oxidized in plasma at 300 K was nearly the same as for the untreated sample. The thickness of the oxide film of the samples which were oxidized at 1000 K was about 170 nm and it consisted of iron oxide. The thickest oxide film of about 350 nm was found on the samples heated in oxygen plasma to 1300 K. Depth profiling showed the uppermost layer of manganese oxide, followed by a mixture of chromium oxide and iron oxide. The scanning electron microscope analyses showed a dramatic increase of the surface roughness.