Abstract
Acta PolymericaVolume 37, Issue 11-12 p. 745-745 New Book Advances in resist technology and processing II. Proceedings of SPIE – The international society for optical engineering. Vol. 539. LARRY F. THOMPSON, Editor. ISBN 0-89252-574-6. Bellingham, Washington: SPIE 1985. VI, 350 S., $ 61.00 G. Reinisch, G. ReinischSearch for more papers by this author G. Reinisch, G. ReinischSearch for more papers by this author First published: November ‐ December 1986 https://doi.org/10.1002/actp.1986.010371125AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinked InRedditWechat No abstract is available for this article. Volume37, Issue11-12November ‐ December 1986Pages 745-745 RelatedInformation
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