Abstract
This paper describes the application of advanced vibration analysis techniques and computational modeling to the design of microelectronics clean rooms. The ASAS (Atkins Stress Analysis System) and ASIST computer models were used to perform dynamic finite element analyses to determine the effects of transmitted structural forces on sensitive photolithographic equipment. The CAFE (Computer Aided Flow Evaluation) computer program was used to recirculate flow problems and evaluate the influences of representative obstructions on laminar air flow. Results of both analyses are presented.
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