Abstract
Characteristics of the adsorption of nitrogen on the (110) plane of tungsten were determined by thermal desorption and work function measurements. The low temperature γ-N 2 state desorbs with first order kinetics and an activation energy of 6 kcal mole −1. The absence of isotope mixing between 14N 2 and 15N 2 demonstrates γ-N 2 is adsorbed molecularly. Monolayer coverage shows a decrease of 0.19 eV in work function. A Topping model plot indicates the layer is immobile at 123 K.
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