Abstract
The martensitic stainless steel X45CrSi93 is widely used in the automotive industry. One way to improve its properties is the deposition of high adhesiveness DLC films, which are well known for their excellent properties such as high hardness, low friction coefficient, chemical inertness, biocompatibility and excellent wear resistance. In this work, the adhesion between substrate and film was studied, by growing silicon interfaces with different deposition parameters. The technique used for growing these films was PECVD pulsed-DC. In order to obtain information of the silicon interface formation, ionic sub-implantation simulations were performed, by the software SRIM/TRIM. Raman spectroscopy was used to verify the atomic structure of the films. Scratch tribological test was performed to study adhesion. It was observed that the mechanical and tribological properties were greatly improved with the deposition of DLC films on the silicon interface. A correlation between the residual stress and adhesion of DLC films was found.
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