Abstract
The structure and residual stresses of ZnO films synthesized by a planar magnetron sputtering system with two facing targets were investigated by X-ray diffraction. ZnO films were deposited onto a sheet of Corning 7059 glass. The X-ray diffraction pattern shows that the film has high 00·1 orientation. Residual strains were measured on various diffraction lines that appear at special angles ψ from the surface normal. The strains taken from positive and negative ψ differed from each other. This behavior is deduced from the existence of a shear stress component in a cross-section of the film. The magnitude of the shear stress increased with increasing current density of the Zn target as well as with decreasing argon gas pressure.
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