Abstract

A U-gate vertical tunneling field-effect transistor (TFET) of band-to-band tunneling (BTBT) normal to the gate at low operation voltages is proposed and investigated by TCAD simulation. In this structure, drive current and OFF-state leakage current can be separately controlled by the insertion of a spacer layer between the channel and drain layers. The dominant mechanisms for drive current and OFF-state leakage are BTBT and source-to-drain tunneling (SDT), respectively. A modified structure of side gates and a hetero-spacer enables high-performance InGaAs/GaAsSb heterojunction TFETs with low OFF-state leakage. Drive current as high as 520 $\mu \text{A}/\mu \text{m}$ with an $I_{ \mathrm{\scriptscriptstyle ON}}/I_{ \mathrm{\scriptscriptstyle OFF}}$ ratio of 107 at an overdrive voltage of 0.3 V was achieved in an InGaAs/GaAsSb heterojunction TFET of a small effective bandgap (0.02 eV). Furthermore, this U-gate TFET structure is fully compatible to VLSI technology without any complicated fabrication steps.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.