A technique for the fabrication of various multiparametric porous silicon samples on a single substrate

Abstract

Porous silicon (PSi) samples generally have a uniform thickness and pore size according to specific anodization conditions, as the Si wafer is entirely immersed into hydrofluoric (HF) acid during the anodization process. In contrast, multiparametric (MP) PSi, as described in the present work, is fabricated by inserting a Si wafer gradually (or by stages) into a HF solution during the anodization process. Consequently, MP-PSi allows single layer fabrication with a pore-size and layer thickness gradient or various multilayers, on a single substrate. Therefore, MP-PSi can be readily used in sensor application areas to determine optimized detection conditions for various materials, such as gas, liquid, and bio-materials. MP-PSi layer with a lateral pore gradient distribution can also be used as size-exclusion matrix. In addition, the MP-PSi multilayer array is expected to open up application areas involving optical electronic nose systems.