Abstract
For investigating extreme ultraviolet (EUV) damage on optics, a table-top EUV focusing optical system was developed in the laboratory. Based on a modified Schwarzschild objective with a large numerical aperture and a laser-plasma light source, this optical system can generate a focusing spot with the maximum energy density of 2.27 J/cm2 at the focal plane of the objective at the wavelength of 13.5 nm. The structures and the characterized properties of this optical system are presented in this paper. For testing the performance of this setup, single-shot EUV damage tests were carried out on an optical substrate of CaF2 and a gold thin film. The damage thresholds and morphologies of these samples were given and discussed with former research studies.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
