A study of ion plating parameters, coating structure, and corrosion protection for aluminum coatings on uranium

Abstract

A study of ion-plating parameters (primarily deposition rate and substrate bias voltage), coating structure, and the corrosion protection provided by aluminum coatings on uranium is presented. Ion plating at low temperatures yields a variety of aluminum coating structures on uranium. For example, aluminum coatings produced at high deposition rates and low substrate bias voltages are columnar with voids between columns, as expected for high-rate vapor deposition at low temperatures. On the other hand, low deposition rate and high bias voltage produce a modified coating with a dense, noncolumnar structure. These results are not in agreement with other studies that have found no relationship between deposition rate and coating structure in ion plating. This discrepancy is probably due to the high deposition rates used in these studies. An accelerated, water vapor corrosion test indicates that the columnar aluminum coatings provide some corrosion protection despite their porous nature; however, the dense noncolumnar coatings provide significantly greater protection. These results indicate that ion-plated aluminum coatings produced at low deposition rates and high substrate bias voltages creates dense coating structures that are most effective in protecting uranium from corrosion.