Abstract
Monoenergetic positrons with variable energy were used to study the agglomeration and release processes of helium atoms implanted in nickel. The energy of positrons was varied from 100 eV to 30 keV. This energy range corresponds to the mean penetration depth of positrons from a few nm to 1 μm. From measurements of Doppler broadening profiles of the positron annihilation as a function of incident positron energy, it was found that the implantation profile of helium is closer to the surface than the calculated one and the presence of dislocations makes the profile shallower. The variation of the implantation profile as a function of isochronal annealing temperature after irradiation showed a clear correlation with the release rate of helium measured by a quadrupole mass spectrometer.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
