Abstract
In this paper, a simple method is demonstrated for patterning conducting polymers based on the combination of the "rabbit ear" effect, which is an unconventional nanoimprint lithography (NIL) method, and isotropic plasma etching (IPE). By integrating these two techniques, complex conducting polymer patterns are fabricated by employing simple stamps. Especially, nanopatterns are created with microscale stamps, which can not be achieved by traditional NIL. The generated feature width can be as small as 12% of the original one. Furthermore, this method can be easily extended to other polymers.
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