Abstract
A method to test the thermal diffusivity of surface-micromachined polysilicon thin films is proposed. It is composed of two polysilicon microbeams with the same width and thickness but different lengths. The thermal diffusivity is extracted from the thermal time dependence of the resistance for the two polysilicon microbeams cooling in free air. The effects of all heat exchange by convection, radiation and heat transfer through the air gap and into substrates are considered in the electrothermal model of the polysilicon microbeam. All measurements can be carried out in free air, and only the four-probe arrangement and digital oscilloscope are needed in experiments. The thermal diffusivity obtained using this method is 0.165 cm2 s−1. The proposed method is suitable for on-line measurement of the thermal diffusivity for surface-micromachined polysilicon thin films.
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