Abstract
AbstractA novel low dielectric constant polymer, plasma-polymerized 1-cyano isoquinoline (PPCIQ) was prepared by plasma polymerization for the first time. The structure and surface compositions of the deposited PPCIQ thin films were investigated by Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS). The results show that a high retention of the aromatic ring structure of the starting monomer in the deposited plasma films is obtained when a low discharge power of 15 W was used during film formation. In the case of higher discharge power of 35 W, more severe monomer molecular fragmentation can be observed. The dielectric properties measurements show that a low dielctric constant of 2.62 can be obtained for PPCIQ thin film deposited at 15 W.
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