A new test specimen for the determination of the field of view of small‐area X‐ray photoelectron spectrometers

Abstract

Small‐area/spot photoelectron spectroscopy (SAXPS) is a powerful tool for the investigation of small surface features like microstructures of electronic devices, sensors or other functional surfaces, and so forth. For evaluating the quality of such microstructures, it is often crucial to know whether a small signal in a spectrum is an unwanted contamination of the field of view (FoV), defined by the instrument settings, or it originated from outside. To address this issue, the d80/20 parameter of a line scan across a chemical edge is often used. However, the typical d80/20 parameter does not give information on contributions from the long tails of the X‐ray beam intensity distribution or the electron‐optical system as defined by apertures. In the VAMAS TWA2 A22 project “Applying planar, patterned, multi‐metallic samples to assess the impact of analysis area in surface‐chemical analysis,” new test specimen was developed and tested. The here presented testing material consists of a silicon wafer substrate with an Au‐film and embedded Cr circular and square spots with decreasing dimensions from 200 μm down to 5 μm. The spot sizes are traceable to the length unit due to size measurements with a metrological SEM. For the evaluation of the FoV, we determined the Au4f intensities measured with the center of the FoV aligned with the center of the spot and normalized to the Au4f intensity determined on the Au‐film. With this test specimen, it was possible to characterize, as an example, the FoV of a Kratos AXIS Ultra DLD XPS instrument.