Abstract

In this paper, by first principle calculations, we investigate systematically the band topology of a new half-Heusler family with composition of I(A)-III(A)-IV(A). The results clearly show that many of the I-III-IV half-Heusler compounds are in fact promising to be topological insulator candidates. The characteristic feature of these new topological insulators is the naturally strong band inversion strength (up to −2 eV) without containing heavy elements. Moreover, we found that both the band inversion strength and the bulk insulating gap of the compounds can be tailored through strain engineering, and therefore would be grown epitaxially in the form of thin films, and useful in spintronics and other applications.

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