Abstract
Multiple ionization of the SiF 4 molecule has been studied using synchrotron radiation and time-of-flight mass spectrometry in a multi-coincidence mode, in the photon energy range of 70–109.4 eV, which encompasses the Si 2p edge. Photoionization branching ratios have been measured under efficient ion extraction and the results are compared to previously published data. Two electron–ion coincidence techniques (PE2PICO, and PE3PICO) have been used in the elucidation of the fragmentation mechanisms of highly excited molecular ions, formed following the absorption of a high-energy photon. It is shown that the unstable doubly charged parent molecule, SiF 4 2+, fragments preferentially (90%) via the asymetric mechanism m 2+→ m 1 2++ m 2.
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