Abstract
Porous silicon has been utilized within a wide spectrum of industries, as well as being used in basic research for engineering and biomedical fields. Recently, surface modification methods have been constantly coming under the spotlight, mostly in regard to maximizing its purpose of use. Within this review, we will introduce porous silicon, the experimentation preparatory methods, the properties of the surface of porous silicon, and both more conventional as well as newly developed surface modification methods that have assisted in attempting to overcome the many drawbacks we see in the existing methods. The main aim of this review is to highlight and give useful insight into improving the properties of porous silicon, and create a focused description of the surface modification methods.
Highlights
Porous silicon is a silicon formulation that has introduced nanopores in its microstructure
The existing methods have been confronted by many challenges, such as hydrosilylation, oxidation, and hydrolytic condensation
We introduced three recently developed and differing surface modification methods of porous silicon; hydrolytic condensation, ring-opening click chemistry, and calcium- or magnesium-silicate formation
Summary
Porous silicon (abbreviated as pSi) is a silicon formulation that has introduced nanopores in its microstructure. Porous silicon can be generated by electrochemical etching of crystalline silicon in hydrofluoric acid (HF) containing aqueous or non-aqueous electrolytes [2]. Silicon (Si) elements in Si wafer can be dissolved out to a hexafluorosilane (SiF6 2− ) ion in the electrochemical etching stage, with each wafer generating a different pore diameter; p-type Si wafer (micropores, 50 nm) [1]. As compared to anodization and sonication processes, recently a new concept in electroless etching of Si powder has been reported that is an scalable process for the generation of pSi particles [4]
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