Abstract
We describe a method of applying large persistent biaxial in-plane tensile stress to thin films by loading a Ta substrate with hydrogen. Using this technique, we studied the influence of biaxial stress on the effective perpendicular magnetic anisotropy (Keff) of Ni and Co50Fe50 thin films. The Keff of Ni increases by 40% whereas for Co50Fe50 it decreases by 15% with respect to that of zero stress state upon applying biaxial stresses of 1.24 and 1.79GPa, respectively. The results are analyzed using a simple model including shape and magnetoelastic anisotropy contributions. The influence of the saturation magnetization and the mechanical properties of the thin films on the maximum achievable relative change of Keff is discussed.
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