Abstract
Formation and development of ion bombardment induced morphology on the surfaces of amorphous solids have been investigated by a computer simulation code. The code calculates the surface topography depending on the sputtering yield-incident angle function, distribution of sputtering yield along surface, reflection and shadow effect. It has been shown that the main cause of the formation of the ripple morphology on the surface is the distribution of the sputtering yield along the surface depending on the incident point and incident angle (“downstream” effect). The wavelength of the ripple depends on the range of the sputtering plot on the surface, and is 10–13 times the distance between the impact point and the point of the maximum sputtering yield.
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