Abstract
Merged dynamic random access memory (DRAM) with logic technology has been widely investigated because of to its high on-chip memory bandwidth, low power consumption, customized memory size, and small footprint advantages. A low thermal budget 0.25–0.18 µm embedded DRAM technology has been developed to merge a high-performance logic device and high-density DRAM on the same chip. In this newly developed technology, shallow trench isolation, a triple well, TiSix polycide, titanium salicide, a self-aligned contact poly-via and a low thermal budget oxide-nitride-oxide (ONO) as well as Ta2O5 capacitor dielectrics used for 1 Gbit DRAM design, are being applied. A 32 Mbit synchronous DRAM macro was designed based on this technology and is proposed offered as a drop-in module for embedded DRAM applications.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.