Abstract
High sensitivity is crucial for anisotropic magnetoresistive (AMR) sensors in industrial applications. In this paper, a high- sensitive AMR sensor based on magnetoresistive thin films with Ta/NiFe/Ta/Al four-layer structure is proposed and fabricated. Firstly, the structural parameters were optimized by finite element analysis. Secondly, thin film samples and AMR sensors were prepared. Through the analysis and characterization of reluctance change rate, hysteresis loop, x-ray diffraction and surface morphology and structure, the process parameters were optimized. Finally, the sensor was connected to the designed external circuit, and its technical parameters were tested in a magnetic field test system. The results show that the prepared AMR sensor performs well. It has a high sensitivity of 1.27 mV/V/Oe, a low bridge offset voltage of ±1.64 mV V−1, and a low temperature coefficient of sensitivity of −0.102%/°C. The results contribute to the future development of AMR magnetic field sensor chips.
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