Abstract
Films of molybdenum and tungsten, 0–500 Å thick have been chemically vapour deposited onto field-ion emitter substrates by the thermal decomposition of the appropriate hexacarbonyl. Epitaxial molybdenum films on tungsten substrates could be progressively field evaporated to reveal the interface. Molybdenum film structure and purity were found to be dependant on deposition temperature, previous substrate thermal rearrangement and vacuum conditions. Tungsten films on field evaporated molybdenum substrates were of high purity, epitaxial, and comparatively insensitive to deposition conditions whilst those on platinum were non-epitaxial but with a pronounced 〈211〉 texture.
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