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- https://doi.org/10.1021/acs.chemmater.6c00586
A Dual-Si Atomic Precursor Enabling High-Quality SiN x Thin Films via Very High-Frequency Plasma Atomic Layer Deposition
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Translate Article A Dual-Si Atomic Precursor Enabling High-Quality SiN <sub> <i>x</i> </sub> Thin Films via Very High-Frequency Plasma Atomic Layer Deposition
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