Abstract
The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 μs pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply.
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