Abstract
This paper explains how large area Roll‐to‐Plate (R2P) Nanoimprinting is combined with Reactive Ion Etching (RIE) to address the emerging needs of a variety of demanding products. In this process sequence, the scalable R2P imprint process is used to apply a structured mask to the functional surface. In a subsequent etching step the texture is transferred into the layer underneath. Using nanoimprinting and dry‐etching in combination is a powerful method for creating large‐area metal structured surfaces or optical structures in glass while improving mechanical durability and optical clarity at reduced costs and in larger volumes.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
