Abstract
The surface morphology of nickel thin films is investigated via atomic force microscopy. The multistage film growth mechanism is found to be dependent on substrate temperature and film thickness. It is shown that conduction electron scattering from the irregularities of the outer and inner surfaces of structures are influenced by the surface morphology and determined by an integrated contribution of the surface’s fluctuation density spectrum. The morphology influence can be decreased under certain growth conditions so that the residual mean free path of conduction electrons can reach 1000 nm, exceeding the film thickness. Epitaxial nanostructures with high electron mobility have been fabricated. Investigation of their magnetic structure has shown that their magnetic domain dimensions are less than the residual mean free path of electrons determined by the surface morphology.
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