Abstract
A compact, reliable high power deep ultraviolet (UV) source should encounter much use in areas such as next generation ultra high density optical disk mastering, photo-lithography and material processing. To achieve this goal, an all solid-state approach is imperative. Commercial UV lasers are currently all gas lasers and therefore tend to be bulky and not very efficient. Recently, much work has been reported on UV sources using nonlinear frequency conversion. Previous approaches however were either not all solid-state [1-2] or were characterized by lower UV power [3-5].
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