Abstract
The effect of point defects on diffusion permeability of triple junctions of high-angle tilt boundaries <111> and <100> and mixed-type grain boundaries in nickel were studied by the method of molecular dynamics. It was shown that intensity of self-diffusion and bond energy of point defects with the triple junction practically independent of the number of defects introduced in the junction area. This is explained, in particular, that the part of the introduced defects migrates to grain boundaries which form the junction.
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