Abstract
The magnetic properties of Co/Pd multilayers seem to be strongly dependent on the surface and interface morphology of the films. Microstructure of the multilayers can be tailored by controlling the process conditions. Effect of two process conditions: (1) changing number of periods and (2) insertion of Pd underlayer, has been studied. In both conditions we have found a common relationship between surface roughness Ra and α(=4π(dM/dH) @H=Hc). Increase of surface roughness caused large decrease of α due to the decoupling of exchange interaction among the grains. In order to confirm the effects of Co and Pd layer roughness, respectively, [Co/Pd]20 multilayers were deposited at different Ar gas pressures PAr for each layer. The M-H characteristics of the films with Pd layers deposited at low PAr didn’t reveal high coecivity Hc. AFM observation clarified that the deposition of Pd layers at high PAr enhances the surface roughness of the multilayers. It was found that a high PAr condition during Pd deposition is essential for high Hc.
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