Abstract
To develop the ultraprecision figuring system is very important and strongly required in many scientific fields. The mirrors for synchrotron radiation X-ray facilities or EUV (extreme ultraviolet) lithography system are required to have atomically smoothed surface and extremely high figure accuracy with the order of nanometer range. EEM that has been developed by authors has been known to be able to prepare the many kinds of optical components with the atomically smoothed surface without any crystallographic damage. On the other hand, several basic researches are performed to evaluate the possibilities of the visualization of numerically controlled EEM system for the ultraprecision figure corrections. In this work, a new type of EEM head, that is for the transportation of ultrafine powders, utilizing a jet flow of the ultrapure water has been developed for the numerically controlled figuring system to realize the good controllability and stability of machining properties such as removal rate and the processed surface qualities. A new EEM system for the figuring practically required optical components described above has been constructed, tested and concluded to have sufficiently good performances for the ultraprecision figuring with the nanometer accuracy.
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