Abstract
A technique for obtaining vanadium oxides of various stoichiometries from vanadyl isopropoxide by chemical vapor deposition is demonstrated. Various vanadium oxides from the Magnelli series have been obtained. Thin-film coatings are applied to the surface of silicon and sapphire. Coatings deposited in an argon flow at temperatures from 220 ˚C to 290 ˚C were evaluated by transmission spectra, Raman scattering and X-ray diffraction. Four oxides (V3O5, VO2, V6O13, V2O5) with different ratios were found in the synthesized amorphous structures. In a number of coatings on silicon substrates, a phase transition of the second kind with a jump in electrical resistance up to 10 times at a temperature of 69 ˚C, was recorded.
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